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Atomic Films Laboratory

About

The Atomic Films Laboratory is a state of the art thin film deposition and measurement laboratory. It features two atomic layer deposition systems, a physical deposition system, and a UHV STM.


Location:

Address:
Micron Engineering Center
1020 S Manitou Ave, Boise ID 83706
Room 104

Contact:

If you have any questions please contact Elton Graugnard


People

Principle InvestigatorElton Graugnard, PhDAssistant ProfessorALD, SPM, DNA-nanotechology
Elton Graugnard, Material Sciences, studio portrait
Lab ManagerSteven LetourneauGraduate Research Assistant (PhD)Atomic Layer Deposition
Letourneau, Steven
ResearcherAmanda StrongGraduate Research Assistant (MS)Chemical Synthesis
Amanda Strong
ResearcherWilliam CrowUndergraduate ResearcherALD of corrosion resistant coatings
William Crow


Equipment

Atomic Layer Deposition Systems

Arraidiance GEMStar XT

arradiance-gemstarxt
Description:
    • Benchtop Atomic Layer Deposition System
    • 200 mm capabilities
    • Current Chemistries:
      HfO2, Tetrakis(dimethylamino)hafnium + H2O
      Al2O3, Trimethylamluminum + H2O
      TiO2, Titanium Chloride + H2O

Arradiance Website

Tube Furnace ALD

tube-ald-crosspurge
Description:
  • Home-built tube furnace ALD
  • NI/Python computer control system: electronic temperature, valve, and gas flow control
  • Up to four chemical delivery paths with individual MFCs controlling carrier gas flow
  • Integrated Inficon Transpector 2 Compact Process Monitor (link)
  • Ability to isolate reaction allows for full-flow, flow-divert and pulse-hold-purge modes of operation
  • Corrosive and toxic gas cross-purge assemblies installed for up too two chemicals

Physical Deposition Systems

“Kyle See”

pvd-kylesee
Description:
  • Home-built PVD system
  • Base system pressure: 10^-9 Torr
  • Dual targets with DC and RF plasma capabilities

Scanning Probe Systems

UHV STM 1

stm1-omicon stm1-omicon-chamber
Description:
  • UHV STM 1 with eddy current vibration isolation system
  • Integrated with an all digital RHK R9 module, including a PMC100 piezo motor controller
  • Pressure achieved: 10^-11 Torr
  • Prep chamber with: electrochemical cells, annealer, cleaver, and cryo shield


Past Researchers (click to expand)

  • 2014 – 2015 Undergraduate Researcher, Griffith Allen, Boise State University
  • 2015 Summer REU Student, Andreas Savva, New Jersey Institute of Technology
  • 2015 Summer REU Student, Jonathan Chen, San Jose State University
  • 2015 Summer REU Student, Gabriel Hanson, Saint John’s University