Skip to Main Content
Mobile Menu

Atomic Films Laboratory


The Atomic Films Laboratory is dedicated to thin films research and development of novel processes for materials synthesis. It features two atomic layer deposition systems, a physical deposition system, a UHV STM and process chamber, and an XPS analysis chamber.

Location:ALD Boise State B

Micron Engineering Center
1020 S Manitou Ave, Boise ID 83706
Room 104


If you have any questions please contact Elton Graugnard


Photo of AFL group members.

College of Engineering, Atomic Films Lab group photo, March 2018. Allison Corona photo

Elton Graugnard, PhDAssistant ProfessorALD, SPM, DNA-nanotechology
Jeunghoon Lee, PhDAssociate ProfessorNanoparticle Synthesis and Functionalization, DNA-nanotechnology
Steven Hues, PhDAffiliate FacultySurface Science, Ultra-high Vacuum Systems
Natalya Hallstrom, PhDLab ManagerAtomic Layer Deposition
Sara GoltryGraduate Research Assistant (PhD)Atomic Layer Deposition Process Development
Jake SoaresGraduate Research Assistant (MS/PhD)Ultra-high Vacuum Systems, Scanning Tunneling Microscopy, Atomic Layer Deposition
Tyler WebbUndergraduate Research AssistantSynthesis and Characterization of 2D Materials
Karen PerezUndergraduate Research AssistantCharacterization of 2D Materials
JD HuesUndergraduate Research AssistantXPS and FTIR materials characterization
Annalies TiptonUndergraduate Research AssistantCharacterization of 2D Materials


Atomic Layer Deposition Systems

Arraidiance GEMStar XT

    • Benchtop Atomic Layer Deposition System
    • 150 mm wafer capacity
  • Chamber temperature 250 C

Arradiance Website

Tube Furnace ALD

photograph of tube furnace ALD system
    • Home-built tube furnace ALD
    • NI/Python computer control system: electronic temperature, valve, and gas flow control
    • Up to four chemical delivery paths with individual MFCs controlling carrier gas flow
    • Integrated Inficon Transpector 2 Compact Process Monitor (link)
    • Ability to isolate reaction allows for full-flow, flow-divert and pulse-hold-purge modes of operation
  • Corrosive and toxic gas cross-purge assemblies installed for up too two chemicals

PHI 5600 XPS System

Photograph of PHI 5600 XPS
    • PHI 5600 XPS System
    • Base system pressure: 2×10^-10 Torr
    • Focused Al and flood Mg X-ray sources
  • Ion sputter gun with Ar, Kr, Xe

Scanning Probe Systems


stm1-omicon stm1-omicon-chamber
    • Omicron UHV STM 1 with eddy current vibration isolation system
    • Integrated with an all digital RHK R9 module, including a PMC100 piezo motor controller
    • Base pressure: 3×10^-11 Torr
  • Prep chamber with: electrochemical cells, annealer, cleaver, and cryo shield

Lab Alumni (click to expand)

  • 2014 Summer REU Student, Michael Reinisch, University of Arkansas
  • 2014 – 2015 Undergraduate Researcher, Griffith Allen, Boise State University
  • 2015 Summer REU Student, Andreas Savva, New Jersey Institute of Technology
  • 2015 Summer REU Student, Jonathan Chen, San Jose State University
  • 2015 Summer REU Student, Gabriel Hanson, Saint John’s University
  • 2014 – 2017 Graduate Researcher, Amanda Strong, Boise State University
  • 2015 – 2018 Undergraduate Researcher, William Crow, Boise State University
  • 2017 – 2018 Undergraduate Researcher, Alondra Perez, Boise State University
  • 2014 – 2018 Graduate Researcher, Steven P. Letourneau, PhD, Boise State University

Literature (Group Members Only)